Electron Beam Aberration Correction Using Optical Near Fields

Aberration correction and electron holography.

Electron holography has been shown to allow a posteriori aberration correction. Therefore, an aberration corrector in the transmission electron microscope does not seem to be needed with electron holography to achieve atomic lateral resolution. However, to reach a signal resolution sufficient for detecting single light atoms and very small interatomic fields, the aberration corrector has turned...

Modeling of optical aberration correction using a liquid crystal device

* [email protected], Tel: (330) 672-2511 ABSTRACT Gruneisen , has shown that small, light weight, liquid crystal based devices can correct for the optical distortion caused by an imperfect primary mirror in a telescope and has discussed the efficiency of this correction. In this paper we expand on that work and propose a semianalytical approach for quantifying the efficiency of a liquid crystal bas...

Progress in aberration-corrected high-resolution transmission electron microscopy using hardware aberration correction.

The design and construction of a double-hexapole aberration corrector has made it possible to build the prototype of a spherical-aberration corrected transmission electron microscope dedicated to high-resolution imaging on the atomic scale. The corrected instrument, a Philips CM200 FEG ST, has an information limit of better than 0.13 nm, and the spherical aberration can be varied within wide li...

Aberration correction in holographic optical tweezers.

Holographic or diffractive optical components are widely implemented using spatial light modulators within optical tweezers to form multiple, and/or modified traps. We show that by further modifying the hologram design to account for residual aberrations, the fidelity of the focused beams can be significantly improved, quantified by a spot sharpness metric. However, the impact this improvement ...

Optimal Design and Fabrication of Fine Diffractive Optical Elements Using Proximity Correction with Electron-beam Lithography